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Axcelis 'Purion XE' High Energy Implanter Selected For New DRAM Fab In Asia Pacific

2015-04-28 08:00 ET - News Release

Industry Leading High Energy System Delivers Superior Purity, Precision and Productivity

BEVERLY, Mass., April 28, 2015 /PRNewswire/ -- Axcelis Technologies, Inc. (Nasdaq: ACLS), a leading supplier of enabling ion implantation solutions for the semiconductor industry, announced that it has penetrated a new DRAM fab with the Purion XE™ single wafer, high energy implanter. The system will support the customer's new 300mm fab in the Asia Pacific region.  The system is scheduled to ship in the second quarter.

Axcelis Technologies, Inc.

John Aldeborgh, executive vice president, customer operations, said, "We're very excited about being selected for this new project. As the process tool of record at this customer's other fabs, the Purion XE will ensure a reliable, smooth path to high volume manufacturing and superior yield at this new venture. We look forward to expanding our footprint as the fab ramps to full production."

The Purion Platform
The Purion platform redefines the ion implanter application space, delivering unmatched purity, precision and productivity to enhance customers' device performance and yield.   On this platform, we've built the industry's first complete implant product solution designed specifically for advanced planar and 3D devices while providing the most flexible and productive manufacturing capability for your fab. The systems' common cross-product platform architecture is designed to drive manufacturing flexibility and lower the total cost of fab operations. All Purion implanters incorporate Axcelis' industry leading Purion Contamination Shield™ Defense System, for unsurpassed implant quality, so even the most sensitive devices can realize optimized device performance.  The platform's proprietary Purion Vector™ dose and angle control system, and constant focal length scanning deliver the most precise and repeatable dopant placement available today.   The platform's superior beam current performance combined with the Purion™ 500wph end station provides the industry's highest productivity. The Purion platform includes the Purion M™ medium current implanter, the Purion H™ high current implanter, and the Purion XE high energy implanter.

About Axcelis:
Axcelis (Nasdaq: ACLS), headquartered in Beverly, Mass., has been providing innovative, high-productivity solutions for the semiconductor industry for over 35 years. Axcelis is dedicated to developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation systems, one of the most critical and enabling steps in the IC manufacturing process. Learn more about Axcelis at www.axcelis.com.

CONTACTS:

Maureen Hart (editorial/media) 978.787.4266
Doug Lawson (investor relations) 978.787.9552

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To view the original version on PR Newswire, visit:http://www.prnewswire.com/news-releases/axcelis-purion-xe-high-energy-implanter-selected-for-new-dram-fab-in-asia-pacific-300072673.html

SOURCE Axcelis Technologies, Inc.

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