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Axcelis Announces New Penetration For 'Purion H' High Current Implanter At Logic Foundry In China

2016-04-07 08:00 ET - News Release

Systems Will Support Volume Manufacturing of Custom Planar Logic Devices

BEVERLY, Mass., April 7, 2016 /PRNewswire/ -- Axcelis Technologies, Inc. (Nasdaq: ACLS), a leading supplier of innovative, high-productivity solutions for the semiconductor industry, announced today that it has achieved a key penetration for the Purion H™ at a custom planar logic foundry in China. This is the second foundry win for the product. The customer also has the Purion XE high energy implanter running in production. The system is scheduled to ship in the second quarter.

Axcelis Technologies, Inc. (PRNewsFoto/Axcelis Technologies, Inc.)

"The Purion platform is ideally suited to support the high volume production needs of this leading foundry," said John Aldeborgh, executive vice president, customer operations. "Its common architecture delivers unmatched process flexibility for manufacturing efficiency and the industry's lowest cost of ownership. In addition, the Purion H features advanced wafer temperature control capabilities and exceptional dopant precision to ensure the highest device yields possible."

President and CEO Mary Puma added, "We continue to execute on our plan to expand our customer base in the foundry and logic markets."

The Power of Purion
The Purion platform redefines the ion implanter application space, delivering unmatched purity, precision and productivity to enhance customers' device performance and yield. On this platform, Axcelis has built the industry's first complete implant product solution designed specifically for advanced planar and 3D devices while providing the most flexible and productive manufacturing capability for our customers. The systems' common cross-product platform architecture is designed to drive manufacturing flexibility and lower the total cost of fab operations. All Purion implanters incorporate Axcelis' industry leading Purion Contamination Shield™ Defense System, for unsurpassed implant quality, so even the most sensitive devices can realize optimized device performance. The platform's proprietary Purion Vector™ dose and angle control system, and constant focal length scanning deliver the most precise and repeatable dopant placement available today. The platform's superior beam current performance combined with the Purion™ 500wph end station provides the industry's highest productivity. The Purion platform includes the Purion M™ medium current implanter, the Purion H™ high current implanter, and the Purion XE™ high energy implanter.

About Axcelis:
Axcelis (Nasdaq: ACLS), headquartered in Beverly, Mass., has been providing innovative, high-productivity solutions for the semiconductor industry for over 35 years. Axcelis is dedicated to developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation systems, one of the most critical and enabling steps in the IC manufacturing process. Learn more about Axcelis at www.axcelis.com.

CONTACTS:

Maureen Hart (editorial/media) 978.787.4266
Doug Lawson (investor relations) 978.787.9552

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To view the original version on PR Newswire, visit:http://www.prnewswire.com/news-releases/axcelis-announces-new-penetration-for-purion-h-high-current-implanter-at-logic-foundry-in-china-300247216.html

SOURCE Axcelis Technologies, Inc.

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