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Axcelis 'Purion XE' High Energy System Chosen By Leading Chipmaker In Asia Pacific Region For DRAM Manufacturing

2014-10-21 08:08 ET - News Release

System Will Be Used To Support Major Capacity Expansion

BEVERLY, Mass., Oct. 21, 2014 /PRNewswire/ -- Axcelis Technologies, Inc. (Nasdaq: ACLS), a leading supplier of enabling ion implantation solutions for the semiconductor industry, announced a new order for the Company's Purion XE™ single wafer, high energy implanter from a prominent chipmaker in the Asia Pacific region. The Purion XE will be used in high volume production of DRAM devices.  The system is scheduled to ship in Q4. 

Axcelis Technologies, Inc.

John Aldeborgh, executive vice president, customer operations, said, "We're very pleased about this new win for the Purion XE at one of the world's leading chip manufacturers, and look forward to supporting their capacity expansion. The tool was chosen over competitive systems because of its highly innovative technology, and significant advantages in productivity.  The Purion XE is the only high energy implanter on the market specifically designed to support the manufacturing challenges of the industry's next generation planar and 3D devices."

The Purion Platform
The Purion platform redefines the ion implanter application space, delivering unmatched purity, precision and productivity to enhance customers' device performance and yield.   On this platform, we've built the industry's first complete implant product solution designed specifically for advanced planar and 3D devices while providing the most flexible and productive manufacturing capability for your fab. The systems' common cross-product platform architecture is designed to drive manufacturing flexibility and lower the total cost of fab operations. All Purion implanters incorporate Axcelis' industry leading Purion Contamination Shield™ Defense System, for unsurpassed implant quality, so even the most sensitive devices can realize optimized device performance.  The platform's proprietary Purion Vector™ dose and angle control system, and constant focal length scanning deliver the most precise and repeatable dopant placement available today.   The platform's superior beam current performance combined with the Purion™ 500wph end station provides the industry's highest productivity. The Purion platform includes the Purion M™ medium current implanter, the Purion H™ high current implanter, and the Purion XE high energy implanter.

About Axcelis:
Axcelis (Nasdaq: ACLS), headquartered in Beverly, Mass., has been providing innovative, high-productivity solutions for the semiconductor industry for over 35 years. Axcelis is dedicated to developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation systems, one of the most critical and enabling steps in the IC manufacturing process. Learn more about Axcelis at www.axcelis.com.

CONTACTS:

Maureen Hart (editorial/media) 978.787.4266
Doug Lawson (investor relations) 978.787.9552

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To view the original version on PR Newswire, visit:http://www.prnewswire.com/news-releases/axcelis-purion-xe-high-energy-system-chosen-by-leading-chipmaker-in-asia-pacific-region-for-dram-manufacturing-169743454.html

SOURCE Axcelis Technologies, Inc.

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