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Axcelis 'Purion XE' High Energy System Selected For Advanced Power Device Manufacturing

2014-10-07 08:00 ET - News Release

Innovative System Chosen Because of Significant Productivity Advantages

BEVERLY, Mass., Oct. 7, 2014 /PRNewswire/ -- Axcelis Technologies, Inc. (Nasdaq: ACLS), a leading supplier of enabling ion implantation solutions for the semiconductor industry, announced a new customer for the Company's Purion XE™ single wafer, high energy implanter. The Purion XE, which is the first high energy implanter to be installed in the customer's fab, will be used in high volume production of advanced power devices. The Purion XE was chosen over competitors systems because of its proven capability to provide dramatically higher productivity. The system shipped in Q3. 

Axcelis Technologies, Inc.

John Aldeborgh, executive vice president, customer operations, said, "We're very excited about this new penetration for the Purion XE at one of the world's leading manufacturers of power devices. It speaks volumes about the confidence customers have in this innovative technology, and in Axcelis as the industry leader in high energy implant. This is the third new customer penetration for the Purion XE this year. This win puts us in a strong position to extend our platform footprint as customers expand their manufacturing capabilities."

The Purion Platform

The Purion platform redefines the ion implanter application space, delivering unmatched purity, precision and productivity to enhance customers' device performance and yield.   On this platform, we've built the industry's first complete implant product solution designed specifically for advanced planar and 3D devices while providing the most flexible and productive manufacturing capability for your fab. The systems' common cross-product platform architecture is designed to drive manufacturing flexibility and lower the total cost of fab operations. All Purion implanters incorporate Axcelis' industry leading Purion Contamination Shield™ Defense System, for unsurpassed implant quality, so even the most sensitive devices can realize optimized device performance.  The platform's proprietary Purion Vector™ dose and angle control system, and constant focal length scanning deliver the most precise and repeatable dopant placement available today.   The platform's superior beam current performance combined with the Purion™ 500wph end station provides the industry's highest productivity. The Purion platform includes the Purion M™ medium current implanter, the Purion H™ high current implanter, and the Purion XE high energy implanter.

About Axcelis:

Axcelis (Nasdaq: ACLS), headquartered in Beverly, Mass., has been providing innovative, high-productivity solutions for the semiconductor industry for over 35 years. Axcelis is dedicated to developing enabling process applications through the design, manufacture and complete life cycle support of ion implantation systems, one of the most critical and enabling steps in the IC manufacturing process. Learn more about Axcelis at www.axcelis.com.

CONTACTS:

Maureen Hart (editorial/media) 978.787.4266
Doug Lawson (investor relations) 978.787.9552

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SOURCE Axcelis Technologies, Inc.

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